Nanofluidics and Lab-on-a-Chip Devices
Chemical vapor deposition (CVD) is a process used to produce thin films and coatings by chemically reacting gaseous precursors to form a solid material on a substrate. This technique is crucial in the design and fabrication of simple nanofluidic devices, as it enables the precise control of layer thickness and material composition, which are essential for achieving desired fluidic properties and device performance.
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