Dry etching is a subtractive fabrication process used in micro and nano electromechanical systems (MEMS/NEMS) where material is removed from a substrate using gaseous chemicals or plasma instead of liquid etchants. This method allows for high precision and control over the etching process, enabling the creation of intricate microstructures and features in various materials. The ability to selectively etch materials while preserving others makes dry etching vital for device fabrication, particularly in the development of advanced applications like drug delivery systems and smart prosthetics.
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