Plasma-assisted Manufacturing
X-ray photoelectron spectroscopy (XPS) is an analytical technique used to determine the elemental composition and chemical state of materials by measuring the kinetic energy of electrons ejected from a sample when it is irradiated with X-rays. This method provides valuable information about the surface chemistry of materials, which is particularly important in the characterization of plasma-synthesized nanomaterials that can exhibit unique properties due to their nanoscale dimensions and surface characteristics.
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