Inorganic Chemistry II
P-type doping is the process of adding specific impurities to a semiconductor material to create an excess of holes, or positive charge carriers, in its structure. This is achieved by introducing elements that have fewer valence electrons than the semiconductor, typically three-valent elements like boron, which create vacancies that can accept electrons, thus facilitating electrical conductivity. P-type doping plays a crucial role in enhancing the electronic properties of solids, particularly in forming p-n junctions essential for various electronic devices.
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